Deposition of metal borides and silicides

ABSTRACT

A method for depositing a metal film onto a substrate is disclosed. In particular, the method comprises pulsing a metal halide precursor onto the substrate and pulsing a reducing precursor onto the substrate. A reaction between the metal halide precursor and the reducing precursor forms a metal film. Specifically, the method discloses forming a metal boride or a metal silicide film.

CROSS-REFERENCE TO RELATED APPLICATION

This application is related to U.S. Non-Provisional patent application Ser. No. 15/135,224, concurrently filed and entitled “DEPOSITION OF METAL BORIDES” and U.S. Non-Provisional application Ser. No. 15/135,333, concurrently filed and entitled “DEPOSITION OF METAL BORIDES,” the disclosures of which are hereby incorporated by reference in their entireties.

FIELD OF INVENTION

The present disclosure generally relates to processes for manufacturing electronic devices. More particularly, the disclosure relates to forming metal gates through atomic layer deposition (ALD). Specifically, the disclosure relates to forming metal silicides and metal borides.

BACKGROUND OF THE DISCLOSURE

Metal boride and metal silicide films have been formed using various chemical vapor deposition (CVD) methods. In the CVD methods, gaseous source chemicals are introduced into a reaction space at the same time, resulting in a deposition of a metal film on the substrate. In order to thermally activate some of the gaseous source chemicals, the CVD methods tend to take place at temperatures as high as 1200° C. The high substrate temperatures relative to thermal budgets may be problematic, especially for state-of-the-art semiconductor fabrication processes such as metallization.

In addition, physical vapor deposition (PVD) methods have also been used to deposit metal films. PVD methods generally deposit along a line-of-sight. However, line-of-sight deposition results in insufficient thin film coverage in certain areas where complex substrate contours are involved. Also, line-of-sight deposition results in low-volatility precursors depositing on the first solid surface encountered, leading to low-conformality coverage.

Atomic layer deposition (ALD) has been used to form metal carbide films. For example, U.S. Pat. No. 7,611,751 to Elers discloses methods for forming a metal carbide film through spatially and temporally separated vapor phase pulses of a metal source chemical, a reducing agent, and a carbon source chemical. Similarly, U.S. Pat. No. 8,841,182 to Chen et al. discloses the formation of titanium carbide films through an ALD process. However, no known ALD solution exists to deposit metal boride or metal silicide films at low temperatures. As a result, a method using ALD to form metal films at low temperatures is desired.

SUMMARY OF THE DISCLOSURE

In accordance with at least one embodiment of the invention, a method for forming a metal boride or a metal silicide is disclosed. The method comprises: providing a substrate for processing in a reaction chamber; performing a metal halide precursor deposition onto the substrate, the performing the metal halide precursor deposition step comprises: pulsing a metal halide precursor onto the substrate; and purging an excess of the metal halide precursor from the reaction chamber; and performing a reducing precursor deposition onto the substrate, the performing the reducing precursor deposition step comprises: pulsing a reducing precursor onto the substrate; and purging an excess of the reducing precursor from the reaction chamber; wherein the metal halide precursor comprises one of: tantalum pentabromide (TaBr₅), tantalum pentaiodide (TaI₅), niobium tetrabromide (NbBr₄), niobium pentabromide (NbBr₅), niobium tetraiodide (NbI₄), niobium pentaiodide (NbI₅), zirconium tetrafluoride (ZrF₄), zirconium tetrachloride (ZrCl₄), zirconium tetrabromide (ZrBr₄), zirconium tetraiodide (ZrI₄), hafnium tetrafluoride (HfF₄), hafnium tetrachloride (HfCl₄), hafnium tetrabromide (HfBr₄), hafnium tetraiodide (HfI₄), molybdenum pentafluoride (MoF₅), molybdenum hexafluoride (MoF₆), molybdenum pentachloride (MoCl₅), molybdenum hexachloride (MoCl₆), molybdenum pentabromide (MoBr₅), molybdenum hexabromide (MoBr₆), molybdenum pentaiodide (MoI₅), or molybdenum hexaiodide (MoI₆); wherein a reaction between the metal halide precursor and the reducing precursor forms a film comprising at least one of: tantalum diboride (TaB₂), niobium diboride (NbB₂), hafnium diboride (HfB₂), zirconium diboride (ZrB₂), molybdenum boride (MoB), tantalum silicide (TaSi₂), niobium silicide (NbSi₂), hafnium silicide (HfSi₂), zirconium silicide (ZrSi₂), or molybdenum disilicide (MoSi₂); wherein the metal precursor deposition step is repeated a predetermined number of times; and wherein the reducing precursor deposition step is repeated a predetermined number of times.

In accordance with at least one embodiment of the invention, a method for forming a metal boride or a metal silicide is disclosed. The method comprises: providing a substrate for processing in a reaction chamber; performing a metal halide precursor deposition onto the substrate, the performing the metal halide precursor deposition step comprises: pulsing a metal halide precursor onto the substrate; and purging an excess of the metal halide precursor from the reaction chamber; and performing a reducing precursor deposition onto the substrate, the performing the reducing precursor deposition step comprises: pulsing a reducing precursor onto the substrate; and purging an excess of the reducing precursor from the reaction chamber; wherein the metal halide precursor comprises one of: tantalum pentabromide (TaBr₅), tantalum pentaiodide (TaI₅), niobium tetrabromide (NbBr₄), niobium pentabromide (NbBr₅), niobium tetraiodide (NbI₄), niobium pentaiodide (NbI₅), hafnium tetrafluoride (HfF₄), hafnium tetrachloride (HfCl₄), hafnium tetrabromide (HfBr₄), hafnium tetraiodide (HfI₄), zirconium tetrafluoride (ZrF₄), zirconium tetrachloride (ZrCl₄), zirconium tetrabromide (ZrBr₄), zirconium tetraiodide (ZrI₄), molybdenum pentafluoride (MoF₅), molybdenum hexafluoride (MoF₆), molybdenum pentachloride (MoCl₅), molybdenum hexachloride (MoCl₆), molybdenum pentabromide (MoBr₅), molybdenum hexabromide (MoBr₆), molybdenum pentaiodide (MoI₅), or molybdenum hexaiodide (MoI₆); and wherein a reaction between the metal halide precursor and the reducing precursor forms a film comprising at least one of: tantalum diboride (TaB₂), niobium diboride (NbB₂), hafnium diboride (HfB₂), zirconium diboride (ZrB₂), molybdenum boride (MoB), tantalum silicide (TaSi₂), niobium silicide (NbSi₂), hafnium silicide (HfSi₂), zirconium silicide (ZrSi₂), or molybdenum disilicide (MoSi₂).

For purposes of summarizing the invention and the advantages achieved over the prior art, certain objects and advantages of the invention have been described herein above. Of course, it is to be understood that not necessarily all such objects or advantages may be achieved in accordance with any particular embodiment of the invention. Thus, for example, those skilled in the art will recognize that the invention may be embodied or carried out in a manner that achieves or optimizes one advantage or group of advantages as taught or suggested herein without necessarily achieving other objects or advantages as may be taught or suggested herein.

All of these embodiments are intended to be within the scope of the invention herein disclosed. These and other embodiments will become readily apparent to those skilled in the art from the following detailed description of certain embodiments having reference to the attached figures, the invention not being limited to any particular embodiment(s) disclosed.

BRIEF DESCRIPTION OF THE DRAWING FIGURES

These and other features, aspects, and advantages of the invention disclosed herein are described below with reference to the drawings of certain embodiments, which are intended to illustrate and not to limit the invention.

FIG. 1 is a flowchart of a method in accordance with at least one embodiment of the invention.

FIG. 2 is a flowchart of a step in accordance with at least one embodiment of the invention.

FIG. 3 is a flowchart of a step in accordance with at least one embodiment of the invention.

DETAILED DESCRIPTION OF EXEMPLARY EMBODIMENTS

Although certain embodiments and examples are disclosed below, it will be understood by those in the art that the invention extends beyond the specifically disclosed embodiments and/or uses of the invention and obvious modifications and equivalents thereof. Thus, it is intended that the scope of the invention disclosed should not be limited by the particular disclosed embodiments described below.

Metal boride and metal silicide films demonstrate potential use in a myriad of applications due to their characteristics. For example, these metal films have a low work function and low resistivity, which make such films ideal for n-metal gate or gate fill applications. Also, the high chemical resistance of metal borides and metal silicides makes them applicable for use in patterning layers and hard masks. Furthermore, the high work function and low resistivity of metal films provide for applicability in p-metal stack, gate fill, and MIMCAP electrodes (SoC).

FIG. 1 illustrates a method for depositing a metal gate in accordance with at least one embodiment of the invention. The method includes a metal halide pulse/purge step 100 and a reducing compound pulse/purge step 200. The steps take place within a reaction chamber of an atomic layer deposition device. Such a device may include an EmerALD® XP ALD process module from ASM International N.V. Within the reaction chamber, a substrate to be processed is placed. The substrate may be made of silicon oxide (SiO₂), silicon (Si), silicon germanium (SiGe), germanium (Ge), gallium arsenide (GaAs), or indium phosphide (InP). The substrate may also have a film of titanium nitride (TiN), titanium oxide (TiO₂), hafnium oxide (HfO₂), or another metallic film.

The metal halide pulse/purge step 100 may be repeated after a previous metal halide pulse/purge step via a pathway 300. Similarly, the reducing compound pulse/purge step 200 may be repeated after a previous reducing compound pulse/purge step via a pathway 310. In addition, the whole process may be repeated via a pathway 320. Such may be desirable in order to form a metal boride film or a metal silicide film of a desired thickness. For example, 50 cycles of the metal halide pulse/purge step 100 and 50 cycles of the reducing compound pulse/purge step 200 may result in the formation of a metal boride or a metal silicide film with a thickness of 200 Angstroms.

FIG. 2 illustrates steps of the metal halide pulse/purge step 100. The metal halide pulse/purge step comprises a metal halide pulse 110 and an inert gas purge 120. Metal halides that may be used in the metal halide pulse 110 comprise tantalum pentabromide (TaBr₅), tantalum pentaiodide (TaI₅), niobium tetrabromide (NbBr₄), niobium pentabromide (NbBr₅), niobium tetraiodide (NbI₄), niobium pentaiodide (NbI₅), hafnium tetrafluoride (HfF₄), hafnium tetrachloride (HfCl₄), hafnium tetrabromide (HfBr₄), hafnium tetraiodide (HfI₄), zirconium tetrafluoride (ZrF₄), zirconium tetrachloride (ZrCl₄), zirconium tetrabromide (ZrBr₄), zirconium tetraiodide (ZrI₄), molybdenum pentafluoride (MoF₅), molybdenum hexafluoride (MoF₆), molybdenum pentachloride (MoCl₅), molybdenum hexachloride (MoCl₆), molybdenum pentabromide (MoBr₅), molybdenum hexabromide (MoBr₆), molybdenum pentaiodide (MoI₅), or molybdenum hexaiodide (MoI₆). In some embodiments, the metal halide may comprise at least one fluorine ligand and the metal is selected to be tantalum (Ta) or niobium (Nb) with an oxidation state +V. In some embodiments, the metal halide may comprise niobium (Nb) with an oxidation state +IV. During the metal halide pulse 110, metal halides may be introduced into the reaction chamber through a showerhead precursor delivery system and be incident on the substrate. The metal halide may interact with active sites on the substrate to form a monolayer film of metal halide.

In order to get optimal film formation, there may be optimal settings to run the process. For example, the metal halide may be kept at a temperature of 80° C. prior to entering into the reaction chamber. The temperature within the reaction chamber during the metal halide pulse 110 may range between 200-400° C., which may prove to be beneficial as providing a low thermal budget. In addition, the pressure within the reaction chamber during the metal halide pulse 110 may be between 0.5 to 8 Torr. Each metal halide pulse 110 may take 0.1 to 10 seconds.

The inert gas purge 120 serves the purpose of removing any excess metal halide precursor introduced into the reaction chamber during the metal halide pulse step 110. Inert gases that may be used during the inert gas purge 120 include nitrogen (N₂), argon (Ar), helium (He), hydrogen (H₂), or other rare gases.

FIG. 3 illustrates the reducing compound pulse/purge step 200 in accordance with at least one embodiment of the invention. The reducing compound pulse/purge step 200 includes a reducing compound pulse 210 and an inert gas purge 220.

The reducing compound pulse 210 involves a pulsing of a reducing compound, which may or may not necessarily perform a reduction reaction. Examples of reducing compounds that may be used include silane (SiH₄), disilane (Si₂H₆), trisilane (Si₃H₈), borane (BH₃), diborane (B₂H₆), triborane (B₃H₈), tetraborane (B₄H₁₀), pentaborane, hexaborane, heptaborane, octaborane, nonaborane, decaborane, or other borane compounds that consist of only boron and hydrogen. In some embodiments, the reducing compound may exceed ten boron atoms. Additional reducing compounds that may be used include amine boranes, cyclic borides, borazines, borane compounds that do not include carbon, and other boron-containing precursors. When the reducing compound pulse 210 commences, the substrate in the reaction chamber may have a monolayer of a metal halide operating as active sites for a reducing compound. For example, the substrate may have a layer of niobium pentaiodide when a pulse of diborane is introduced into the reaction chamber. The diborane reacts with the niobium pentaiodide according to the following equation in order to form a pure niobium boride film: NbI₅+B₂H₆→NbB₂+HI+H₂

Similarly, the reaction of tantalum pentafluoride with diborane would result in the formation of a tantalum boride (TaB₂) film. With the metal halide precursors mentioned previously, the following borides or silicides may be produced: hafnium diboride (HfB₂), molybdenum boride (MoB), tantalum silicide (TaSi₂), zirconium boride (ZrB), zirconium silicide (ZrSi₂), niobium silicide (NbSi₂), hafnium silicide (HfSi₂), or molybdenum disilicide (MoSi₂). The formation of pure niobium boride or pure tantalum boride films is advantageous due to properties of oxidation resistance, high chemical resistance, high stiffness, and low resistivity in proper phase, for example. Such films have great applicability in patterning layers, hard masks, back-end-of-line (BEOL) interconnects, gate barriers, and gate fills.

Similar to the metal halide pulse 110, in order to get optimal film formation, there may be optimal settings to run the borane compound pulse 210. For example, the borane compound may be kept at a temperature of 25° C. prior to entering into the reaction chamber. The temperature within the reaction chamber during the borane compound pulse 210 may range between 200-400° C., which allows for a low thermal budget. In addition, the pressure within the reaction chamber during the reducing compound pulse 210 may be between 0.5 and 8 Torr. Each reducing compound pulse 210 may take between 0.1 and 10 seconds.

The inert gas purge 220 serves the purpose of removing any excess borane compound precursor introduced into the reaction chamber during the borane compound pulse step 210. Inert gases that may be used during the inert gas purge 220 include nitrogen (N₂), argon (Ar), helium (He), hydrogen (H₂), or other rare gases.

As a result of the cycling, a metal boride or silicide film may be formed. The film may include a metal-boride or metal-silicide bond. On the other hand, the film may include a metal and boron (or silicon) trapped inside a film without a true metal-boride or metal-silicide bond. The film may be used in MOS applications, for example. The film may include elements having the following atomic concentrations: (1) Boron or Silicon from about 30 to about 80%, preferably from about 50 to about 80%, and more preferably from about 60 to about 70%; (2) metal from about 20 to about 70%, preferably from about 20 to about 50%, and more preferably from about 30 to about 40%; (3) Oxygen having less than about 5%, preferably less than 1%; (4) Hydrogen having less than about 5%, preferably less than 1%; and (5) halide having less than about 5%, preferably less than 1%.

The particular implementations shown and described are illustrative of the invention and its best mode and are not intended to otherwise limit the scope of the aspects and implementations in any way. Indeed, for the sake of brevity, conventional manufacturing, connection, preparation, and other functional aspects of the system may not be described in detail. Furthermore, the connecting lines shown in the various figures are intended to represent exemplary functional relationships and/or physical couplings between the various elements. Many alternative or additional functional relationship or physical connections may be present in the practical system, and/or may be absent in some embodiments.

It is to be understood that the configurations and/or approaches described herein are exemplary in nature, and that these specific embodiments or examples are not to be considered in a limiting sense, because numerous variations are possible. The specific routines or methods described herein may represent one or more of any number of processing strategies. Thus, the various acts illustrated may be performed in the sequence illustrated, in other sequences, or omitted in some cases.

The subject matter of the present disclosure includes all novel and nonobvious combinations and subcombinations of the various processes, systems, and configurations, and other features, functions, acts, and/or properties disclosed herein, as well as any and all equivalents thereof. 

We claim:
 1. A method of forming a metal boride or a metal silicide comprising: providing a substrate for processing in a reaction chamber; performing a metal halide precursor deposition onto the substrate, the performing the metal halide precursor deposition step comprises: maintaining a metal halide precursor at a first temperature prior to the metal halide entering into the reaction chamber; pulsing the metal halide precursor onto the substrate; and purging an excess of the metal halide precursor from the reaction chamber; and performing a reducing precursor deposition onto the substrate, the performing the reducing precursor deposition step comprises: maintaining a reducing precursor at a second temperature prior to the reducing precursor entering into the reaction chamber; pulsing the reducing precursor onto the substrate; and purging an excess of the reducing precursor from the reaction chamber; wherein the metal halide precursor comprises one of: niobium tetrabromide (NbBr₄), niobium tetraiodide (NbI₄), zirconium tetrabromide (ZrBr₄), zirconium tetraiodide (ZrI₄), molybdenum pentabromide (MoBr₅), molybdenum hexabromide (MoBr₆), molybdenum pentaiodide (MoI₅), or molybdenum hexaiodide (MoI₆); wherein a reaction between the metal halide precursor and the reducing precursor forms a film of: niobium diboride (NbB₂), zirconium diboride (ZrB₂), molybdenum boride (MoB), niobium silicide (NbSi₂), zirconium silicide (ZrSi₂), or molybdenum disilicide (MoSi₂); wherein a pressure of the reaction chamber ranges between 0.5 and 8 Torr; wherein the first temperature is different than the second temperature; wherein the metal precursor deposition step is repeated a predetermined number of times; and wherein the reducing precursor deposition step is repeated a predetermined number of times.
 2. The method of claim 1, wherein the reducing precursor comprises at least one of: silane (SiH₄), disilane (Si₂H₆), trisilane (Si₃H₈), amine boranes, cyclic borides, and borazines.
 3. The method of claim 1, wherein a temperature of the reaction chamber ranges between 200 and 400° C.
 4. The method of claim 1, wherein the reducing precursor comprises borane, diborane, triborane, tetraborane, pentaborane, hexaborane, heptaborane, octaborane, nonaborane, decaborane, or other borane compound that consist of boron and hydrogen, cyclic borides, borazines, and borane compounds that do not include carbon.
 5. The method of claim 1, wherein the first temperature is higher than the second temperature.
 6. The method of claim 1, wherein the film comprises niobium diboride (NbB₂), zirconium diboride (ZrB₂), or molybdenum boride (MoB).
 7. The method of claim 1, wherein purging the excess of the metal halide precursor comprises purging the reaction chamber with at least one of: nitrogen (N₂), argon (Ar), helium (He), hydrogen (H₂), or other rare gases.
 8. The method of claim 1, wherein purging the excess of the reducing precursor comprises purging the reaction chamber with at least one of: nitrogen (N₂), argon (Ar), helium (He), hydrogen (H₂), or other rare gases.
 9. A method of forming a metal boride or a metal silicide for NMOS applications comprising: providing a substrate for processing in a reaction chamber; performing a metal halide precursor deposition onto the substrate, the performing the metal halide precursor deposition step comprises: maintaining a metal halide precursor at a first temperature prior to the metal halide entering into the reaction chamber; pulsing the metal halide precursor onto the substrate; and purging an excess of the metal halide precursor from the reaction chamber; and performing a reducing precursor deposition onto the substrate, the performing the reducing precursor deposition step comprises: maintaining a reducing precursor at a second temperature prior to the reducing precursor entering into the reaction chamber; pulsing the reducing precursor onto the substrate; and purging an excess of the reducing precursor from the reaction chamber; wherein a temperature of the reaction chamber ranges between 200° C. and 400° C.; wherein the first temperature is different than the second temperature; wherein the metal halide precursor comprises one of: niobium tetrabromide (NbBr₄), niobium tetraiodide (NbI₄), zirconium tetrabromide (ZrBr₄), zirconium tetraiodide (ZrI₄), molybdenum pentabromide (MoBr₅), molybdenum hexabromide (MoBr₆), molybdenum pentaiodide (MoI₅), or molybdenum hexaiodide (MoI₆); and wherein a reaction between the metal halide precursor and the reducing precursor forms a film of: niobium diboride (NbB₂), zirconium diboride (ZrB₂), molybdenum boride (MoB), niobium silicide (NbSi₂), zirconium silicide (ZrSi₂), or molybdenum disilicide (MoSi₂).
 10. The method of claim 9, wherein the reducing precursor comprises at least one of: silane (SiH₄), disilane (Si₂H₆), trisilane (Si₃H₈), borane (BH₃), diborane (B₂H₆), triborane (B₃H₈), tetraborane (B₄H₁₀), pentaborane, hexaborane, heptaborane, octaborane, nonaborane, decaborane, borane compounds that consist of only boron and hydrogen, amine boranes, cyclic borides, borazines, and borane compounds that do not include carbon, and other boron-containing precursors.
 11. The method of claim 9, wherein the film comprises zirconium diboride (ZrB₂), zirconium silicide (ZrSi₂), or molybdenum disilicide (MoSi₂).
 12. The method of claim 9, wherein a pressure of the reaction chamber ranges between 0.5 and 8 Torr.
 13. The method of claim 9, wherein the pulsing the metal halide precursor has a duration of 0.1 and 10 seconds.
 14. The method of claim 9, wherein the film niobium diboride (NbB₂), zirconium diboride (ZrB₂), or molybdenum boride (MoB).
 15. The method of claim 9, further comprising repeating the step of performing a metal halide precursor deposition prior to the step of performing a reducing precursor deposition.
 16. The method of claim 9, further comprising, after the step of performing a reducing precursor deposition, repeating the step of performing a reducing precursor deposition prior to a step of repeating the step of performing a metal halide precursor deposition.
 17. The method of claim 9, wherein the film has a concentration of Boron or Silicon from about 30 to about 80 at. %.
 18. The method of claim 9, wherein the film has a concentration of a metal from about 20 to about 70 at. %.
 19. The method of claim 9, wherein the film has a concentration of Oxygen of less than 5 at. %.
 20. The method of claim 9, wherein the film has a concentration of Hydrogen of less than 5 at. %.
 21. The method of claim 9, wherein the film has a concentration of a halide of less than 5 at. %. 